Dry-in/dry-out
Excellent process performance
Reliable structure (one table-one head, dual module system)
High operation rate/High throughput
Suitable for multi-stage chemical cleaning
Detection monitor at polishing endpoint (optional)
In-line film thickness measuring device (optional)
Diverse functions and flexible equipment configurations
Module structure easy to modify and maintain
Flexible transport mechanism
With a newly developed high-efficiency transport mechanism and WPH optimization algorithm, Ebara's highly reliable structures are maintained, such as one table-one head and a dual module system, enabling further productivity improvement. Adopting a flexible transport mechanism and further measures against cross-contamination contributes to improved yield. It also adopts a module structure that is easy to modify and upgrade, enabling installing new functions with less time in the future. In addition, power consumption is reduced by approximately 10% compared to the F-REX300X type, and the number of parts is also reduced, thereby achieving sustainability goals like reducing CO2 emissions in the supply chain. It supports more environmentally friendly semiconductor manufacturing.
Model F-REX
High performance, high throughput for high productivity
Model EAC
Fixed abrasive for excellent polish/removal performance, edge control function
Model UFP
Achieves both high-throughput, high-speed plating and superior uniformity performance